Annexure

ITEM NUMBER 01: NMR Spectrometer

Tender Requirements

Latest Technology based stable and actively shielded superconducting magnet (9.4 Telsa) with an
operational frequency of 400 MHz for 1H. Vendor should quote their latest model.

Shortest possible 5G radial and axial field from the centre of the magnet

Bore diameter: 54 mm (standard bore).

With lowest field drift rate quoted in Hz/hr.

Liquid Nitrogen hold time should be at least 10 days

Vendor should quote for the magnet currently available with alteast 200 days hold time.

Specify the number of cryo-shims.

Minimum of twenty room-temperature shim systems.

Anti-vibration feet pad for dampening the floor vibrations (frequency damped above 5.0 Hz).

Digital meters for both liquid Nitrogen and liquid Helium.

All support equipment for cryostat (e.g., liq. He and liq. N2 transfer lines).

Standard test samples for multinuclear studies (in shield tubes)

Advanced feature based two broadband frequency generation independent RF channels (full
frequency range generation) with best frequency and phase resolution; fast switching time for all
parameters, without any hidden delays. It should include wave form generators for pulse shaping,
amplitude, phase and composite pulse decoupling generator, preamplifiers with standard filters and
digital receiver control with oversampling and quadrature detection with digitizers facility for
complete elimination of quadrature spikes

24 sample auto sampler should be quoted.

2-Channel Amplifier System: Two high performance linear amplifier for observation- or decoupling of
1H /19F with 50 W pulse power minimum and 150 W. Pulse power maximum in the range of 1H or
19F, with 50 W and 150 W pulse power maximum in the range of cycle, maximum pulse duration
etc. have to be explicitly specified.

Low- and high-temperature accessories. Variable temperature unit should include:

a. Controller should be for long term temperature stability at both high and low ranges.
b. High temperature range:
1. Ambient to approx. +150 C
c. Nitrogen cooling system range: -100 to Room Temperature

5 mm multinuclear broadband observe probe head with Z-shielded gradient. Automatic tuning and
matching (ATM).

300 NMR tubes with caps

High performance state-of-the-art workstation (Windows operating system) for acquisition and
processing that can be easily serviced in India in case of any fault:

22/24 LCD monitor, one terabyte Hard Disk, 3 GHz Processor, 4 GB RAM etc.

CD-DVD read-write drives

USB Ports (minimum of four ports)

High performance printers, 2 nos (Laser color and B/W)

Scanner (resolution of 2400 dpi)

Licensed Software Modules include:

a) Acquisition, Processing, Plotting, Structure Verification and Analysis-1D and 2D (HSQC,

TOCSY, COSY, HETCOR, NOESY, HMBC, DOSY etc.), Experiment Simulation, Spectra

Simulation, Multiplet Analysis, Teaching Software, Deconvolution, Automation, Projection

Reconstruction Spectroscopy.

Automated No D software should be quoted as standard

b) The vendor should provide ten floating licenses along with one processing PC (with latest
configuration) for off-line processing (Processing, Plotting, Structure Verification,

Experiment Simulation, Spectra Simulation, Multiplet Analysis, Teaching Software,

Deconvolution, Automation, Projection Reconstruction Spectroscopy).

1. 2 containers of 55 litres capacity along with liquid Nitrogen transfer line required for regular filling

of liquid Nitrogen in the cryomagnet.

2. One trolley for transporting 55 litres Cryocans.

3. An ISO-9001 certified oil-free scroll air-compressor complete with dryer with proper ratings and

specification capable of catering all the needs, with a sufficiently big buffer tank along with the

system (proprietary item).

Power backup:

1. A suitable ISO-9001 certified UPS (5 KVA) for the whole system with a minimum of 2 hours backup

time. The Price should be quoted in INR

Installation:

The liquid helium required for installation should be provided by the NMR supplier at

their expense. Supply and refilling contract of liquid Helium is for 3 years from the date of

installation.

Warranty:

Comprehensive on-site warranty for 2 years after completion of standard one year warranty
including:
(a) All parts and labor
(b) Free maintenance and service
(c) Regular upgrades to all software during the entire warranty period.
(D) Trained operator for NMR for a period of 3 years to be provided at our site by vendor.
(e) 2 nos of room ACs to be provided for maintaining room temperature.
(f) One additional Auto Tuneable BBFO Probe for backup.
 ITEM NUMBER 02: HIGH RESOLUTION QUADRUPOLE TIME OF
FLIGHT MASS SEPCTROMETER (Q-ToF) WITH SUITABLE LIQUID
CHROMATROGRAPHY SYSTEM

Parameter Description

High Resolution Quadrupole Time of Flight Mass Spectrometer (Q ToF)

1 ION SOURCE The instrument must be equipped with an High Performance

dual Orthogonal (preferable) atmospheric pressure ionisation
(API) technique.
Combined Source for Electro Spray Ionization (ESI) &
Atmospheric Pressure Chemical Ionisation (APCI) to cover all
areas of applications must be provided as standard.
Facility for switching between the two ionization types (ESI &
APCI) during a single LCMS experiment should be available
Positive and negative ionization capabilities must be included as
standard on the instrument.
Suitable facility for sample introduction by direct infusion, or the
system may be interfaced directly to a HPLC/UPLC
An isolation valve must be fitted to the source to allow the
source elements to be removed and cleaned without breaking
instrument vacuum, maximizing instrument uptime.
2 INTERFACE Simple interface for maintaining cleanliness of ion optics and
capable of handling large batches of complex samples. It should
have a low maintenance inter face which should not require
frequent cleaning.
3 MASS ANALYZER Quadrupole: The instrument should be supplied with an
(High resolution) quadrupole mass analyzer for the efficient transmission of ions
The instrument should be capable of operating in mass range
upto 4000 m/z

TOF: The mass range of the analyser must be up to 100,000

m/z.
Resolution must be 32,000 FWHM
4 COLLISON CELL The instrument should be configured with a collision cell for
maximum transmission of ions at fast data acquisition speeds
5 VACUUM SYSTEM A fully protected air cooled vacuum system using turbo
molecular pumps and rotary pumps. Vacuum read backs and
automated vent system.
6 ACQUISITION RATE Minimum 30 Spectra per second

7 RESOLUTION The resolution of the instrument should be 32,000 (FWHM).

8 MASS ACCURACY Minimum 1 ppm, with both internal & external calibration. (For
both MS & MS/MS modes) on 10 consecutive repeat
measurements using suitable lock mass.
9 SENSITIVITY State the sensitivity achieved in MS & MS/MS modes. The
signal to noise (S/N) ratios or counts per second must be
specified along with the full analyses conditions
10 LINEAR DYANAMIC At least four orders of magnitude for quantitative acquisition.
RANGE
11 DIRECT INFUSION Syringe pump or equivalent for direct infusion of samples.
12 REFERENCE MASS Capable of internal reference mass correction for MS and
INTRODUCTION MS/MS operation without losing sensitivity
13 ACQUISTIION MODES Following acquisition modes must be available:
1. MS Scanning
2. MS/MS product Ion Scanning
3. Simultaneous MS & MS/MS scanning. The software
should be capable of data acquisitions whereby high and
low collision energy data is acquired simultaneously to
provide fragmentation data for all detectable molecular
ions. The instrument should alternate between low and
high-energy in the collision cell at user-defined intervals.
In the low-energy acquisition it records the mass
spectrum exhibiting mainly precursor ions, and in the
high-energy acquisition their respective fragment ions
14 COMPUTER PLATFORM A standard make PC with all necessary hardware and operating
software required to operate all the specified equipments. All
hardware and software including drivers, TFT color monitor,
device interface cards or control cards/ network adaptor card
must be preinstalled and pre-configured on the computer
provided. The computer must control the mass spectrometer; LC
system, & auto sampler, in an integrated fashion.
15 OPERATING The software should have capabilities to perform the following
SOFTWARE functions.
System parameter checking and alerts
Integrated sample/calibrant delivery system + programmable
divert valve
Automated mass calibration
LC/MS System Check automated on-column performance test
Software tools for addressing following workflow
a)Screening
b)Component Identification
c)Structural Elucidation
d) The data processing software must incorporate an
elemental composition calculator as standard. Included into the
calculator must be algorithms for isotope pattern modeling that
allow data interpretation of actual isotope patterns. A goodness
of fit from actual to theoretical isotopes must be included. The
ability to filter out incorrect elemental composition calculations
through the use of intelligent spectral interpretation algorithms
must be incorporated.
Software for automated product ion spectra assignment using
known precursor structure should be quoted for benefits from
 accurate mass information.
16 GAS GENERATOR A suitable gas generator with built-in compressor capable of
providing all the gases at the required purity, pressure and flow
rate for the Mass Spectrometer must be quoted. The compressor
should be noise-free. All the required accessories such as
arrangement for gas supply through gas generator, and any other
essential item for operation of the instrument should be supplied
along with the instrument.

17 Solid Analysis Probe An atmospheric pressure solids analysis probe for the direct
sampling and introduction of solids and liquids into the
instrument must be quoted.
18 LIQUID CHROMATOGRAPHY HPLC /UPLCSYSTEM:
A liquid chromatography system should provide an integrated configuration for solvent and
sample management with the following specifications

Pump : Quaternary Pumps/Solvent Manager, low pressure

mixing Capable of switching between four solvents
Vacuum degassing capability five or more-channel
Operating Flow Rate Range to be 0.010 to 2.000
mL/min, in 0.001 mL increments.
System Delay Volume < 400ul, independent of system
backpressure (with standard mixer)
Gradient Profiles Eleven (11) gradient curves
Maximum Operating Pressure 15,000 at upto 1
mL/min

Auto sampler: Number of Samples : 90 vials or more of 2 ml capacity

Injection Volume Range 0.1 10 uL,
Sample Temperature 4 - 40 deg. C programmable in 0.1
deg. C increments (ambient temp of 20 deg. C)
Sample Carryover < 0.005% or < 2.0 nL, whichever is
greater (with dual wash).
Linearity: >0.999
Column Heater: Column Temperature Control 20 to 80 deg. C, 0.1 deg.
C increments.
Column Tracking & Storage Device should be
provided
UV-Visible Detector: Wavelength Range : 190-700nm
Wavelength Accuracy : 1nm or better
Data acquisition rate : Up to 80 Hz
Light source : Deuterium lamp
Optical Bandwidth : 5 nm or better
Flow Cell Path Length : 10 mm
Flow Cell Volume : less than 1.0 microlitre

19 SINGLE POINT OF Single point control for both LC and MS system

CONTROL
20 HARDWARE Both LC and MS should be from same manufacturer
21 TRAINING Installation and training for application and maintenance at site
22 WARRANTY 3 Year standard warranty from the date of installation.
Warranty should cover:
1. All parts including accessories and labour.
2. Free maintenance and service
 ITEM NUMBER 03: POWDER X-RAY DIFFRACTOMETER

Specifications:

XRD system should be capable of carrying out applications including powder diffraction,
thin film and small angle scattering for characterization of nano-powders and nano-particles.
System should be upgradable for further incorporation of additional components such as
High/Low temperature attachment.

S.No. Component Specification

1 Enclosure
2 X-Ray Generator
3 X-Ray Tube
4 Goniometer
5 Sample Holders
6 Detector
a) Full Radiation protection chamber as per radiation safety
norms.
a) Continuous power output: 0- 3.0 kW or higher.
b) High voltage output minimum 50kV or higher.
c) Continuously variable tube current upto 60 mA or better
d) Output stability 0.01% or better (for 10% mains variation)
e) Fully Microprocessor controlled
f) Operating power supply: 220V(+/- 10%), 50Hz
Long fine focus ceramic tube of anode material Cu
Power rating compatible with generator
Flip type change over from line focus to point focus
without any manual intervention e.g. for alignment
Necessary secondary beta filters
Automated high-resolution Vertical with theta-theta
geometry
The Goniometer motor should be driven through
synchronous DC or stepper motor for better accuracy
and for fast step scan
Two theta range: minimum 1 to165 or better
Angular reproducibility: +/- 0.0001 deg. or better.
Goniometer diameter: minimum 400 mm or above
Scanning mode: Continuous scan, step scan, theta or 2
theta scan, fast scan.
Position reading: The theta 2 theta position reading
should be controlled by digital optical encoders.
Accuracy of 0.003 deg or better
Standard Sample Holders 20 Nos
Zero background Sample holder with cavity for low
sample volumes
Sample holders set for SAXS experiments
Sample holders for reflection geometry
Scintillation detector or Xenon proportional counter

7 Beam Optics Primary Optics inclusive of divergent slits for measurable

angle from 1 deg to 165 deg two theta
Secondary Optics inclusive of anti-scatter and receiving slits
for measurable angle from 1 deg to 165 deg two theta
Facility to operate both in conventional Bragg-Brentano and
 parallel beam geometry is essential.
The procedure for changing from Bragg Brentano geometry
to parallel beam geometry should not require any alignment
Basic XRD system should be capable of analyzing powder
sample in reflection mode from 0.5 (2Theta) or less.
Parallel plate collimator for thin film studies.
8 SAXS Necessary optics applicable for SAXS application with (i)
monochromatic (ii) high intensity collimated beam having
reduced axial divergence should be given.
9 Sample Stage Rotational sample stage(s) for transmission and
reflection with variable speed .
Sample stage for Normal XRD and SAXS
measurements
Sample stage with phi axis rotation for optimum
alignment of thin film samples
10 Calibration The vendor must provide data quality guarantee on the
Standards angular position and intensity ratio which is to be carried out
on NIST sample. The same NIST standard sample should be
in the scope of supply for evaluation.
SRM Silicon Standard
SAXS Standard reference samples with known particle size
and covering a range of 10-70nm should be provided.
11 Software Full instrument control
Auto alignment for the XRD system along with
automatic component recognition
Data acquisition
Processing
Search match
Background subtraction
2 Stripping
Smoothing
XRD system diagnostic facility
Line Profile analysis
Software to classify the samples based on Systematic
non-parametric analysis of patterns should be
included..
Complete search/ match programme with back ground
subtracted data, search-match for phase identification.
Crystallite size & strain analysis
License for10 users for offline XRD data processing
for crystallite size, crystallinity, strain. Each software
license should be for independent user and computer
without any necessity for connecting in LAN for
additional users.
Software should be offered for SAXS analysis
capable of multimodal size analysis and simulation of
spherical, elliptical and cylindrical particles
12 Stress & Texture Point optics for conducting experiments for Stress
(residual as well as omega stress) and texture in
point optics mode.
Cradle for mounting samples to do stress and
texture. This cradle should have psi (range 0-90
degrees) and phi (0-360 degrees)movements
- geometry and texture goniometer
Secondary optics for conducting experiments for
Stress and texture in point optics mode.
Licensed software for Stress and texture with
original CDs from supplier.
13 Computer The computer must be provided (preloaded/during
installation) with all the necessary software like
Operating system Windows 7, for operation of the
equipment, data storage, retrieval, and any other
software required for smooth running of the
equipment and data management.
Monitor: 22" Flat Panel TFT LCD
Color Deskjet Printer
14 Documentation The documentation should be provided in Hardcopy and
Softcopy
Two sets of Software Manuals to be provided
Complete circuit diagram and operation & maintenance
manual for the basic diffractometer and for all the
attachments.
15 Chiller Unit Compact indoor Chiller unit to be installed alongside the
main equipment for supply of cooling water to tube

16 Installation & The instrument to be installed, tested and commissioned by

Commissioning representative of manufacturer at the MNIT-Jaipur
premises
17 Training The supplier should provide the training for Operation,
Software, Handling of Optics / X-Ray Tube / Detector and
Maintenance at the site of installation
Application training on various applications from a
qualified application specialist. This training should be in
addition to the operational training provided by a service
engineer using reference samples. Application specialist
should be capable of explaining each and every aspect of
analysis software using real samples.
18 Essential Spare The vendor to provide a list of spares, along with prices,
Parts sufficient for at least 2 years, after the 12 months
mandatory warranty is over.
19 Warranty The vendor should give warranty for the complete system
for minimum 3 years (36 months) after successful
installation/commissioning, with no cost to MNIT-Jaipur
for any repair work / part replacement during this
mandatory warranty period.
20 Other Specifications The complete system should operate at standard 230 V, 50
/ requirements Hz power supply
 ITEM NUMBER 04: DSC-TGA

Tender Description:

Tender for the supply, delivery, installation, testing and commissioning of one unit of DSC-
TGA-DTA with simultaneous scanning facility in single run.

Technical Specification:
The system should have built-in TGA/DSC/DTA/DTG/T mode with simultaneous
scanning facility in single run.
Temp range from 15oC to 1000 C or better
The system must cool down from 1000C to 50C in under 12 min or better.
The system should have heating and cooling rates from 0.1 to 100 C/min or better.
Thermocouple: Pt/Pt-Rh.
Temperature Accuracy and reproducibility: 0.5C or better
TGA should have ultra-Microbalance with minimum 0.1 micro gram sensitivity with
top load design.
Balance measurement Range (sample size) up to 1200 mg or better
The system shall be supplied with Pt and Ceramic pans.
The system should be upgradable to Auto-sampler in future.
Built-in Mass Flow controller for two difference gases viz. N2, O2 or any other. It
should also select the flow of gases through software and shall be displayed on the
screen for on line display as well as getting stored with method..
Reference Materials for DSC and TGA calibrations should be included.
The system should be supplied with windows based software and include Kinetics
software along with main unit. Standard software shall have the flexibility of various
standard calculations like onset, peak area, compare, derivatives, subtraction, % wt
loss, overlay of curves, delta Y calculations, real time reference curve capability, real
time calculation capability, save several different data files into one file, Software
must allow running upto 8 units/ multiple Thermal instruments simultaneously etc.
It should have the flexibility of upgradationof hyphenated analytical techniques to
FTIR and MS form the same vendor,.
Accessory: Suitable PC, Julabo/Polyscience Chillier through OEM, N2 Cylinder and
regulator , printer, On line UPS of 5 KVA with 30 min Backup should be supplied
along with System
All the specifications must be guaranteed with printed and authentic literatures.
 ITEM NUMBER 05: HIGH RESOLUTION FIELD EMISSION
SCANNING ELECTRON MICROSCOPE

Essential Specifications :

High resolution Schotkey emitter FESEM with latest technology must have following
minimum specs.

Specifications:

1. Resolution 3 nm or more Mention at 1kV/15kV/30kV

2. Magnification Up to x10,00,000

3. EHT 200V to 30KV

4. Chamber Large chamber with at least 5 or more accessory port.

5. Stage 5 axis motorized stage with motorized stage movements

equivalent to or better

X >110mm

Y >75mm

Z >10 mm

Tilt=0-70

R=360

6. Probe Current 20 nA or more (Continuously adjustable)

7. Detectors a) Chamber SEI detector.

b) In-Lens,SEI/ BSE detector for high resolution imaging in High

Vacuum at low KV.

c) CCD camera

d)High resolution EBSD detector (Lens mounted)

8. User Interface Keyboard, Mouse, Hard Panel with multifunction for the control
and adjustment of frequently used SEM parameters, Manual
Joystick control for stage axis, Optical Mouse.

9. Electron Optics Beam Deceleration technology or equivalent for high resolution

imaging at low KV.

Ease of operation is desired.

10. Display 2 No. 19 TFT Monitors

11. Vacuum System Suitable vacuum system having ion pump, Turbo Pump & R.P.

12. Essential Accessories a)IRCCD camera

b) Chiller.

c) Compressor.

d) Interface between SEM and EDS.

e) UPS 10 KVA with 2 Hr back up.

f)1 Spare Filament

h)Particle Size analysis software with license & back-up CD

i) Carbon Sputter Coater

j)Consumables for 3 years Operation, details must be clearly

mentioned with quantity. Give separate price for these.

k)Company must have at least 5 FESEM installation in India.

13. EDS Integrated EDS system.

EDS: LN2 Free SDD detector with 20mm crystal area and
127eV resolution. The EDS should be capable of selective
element mapping (Mn K alpha) line scan, selected area
Analysis, Quantitative Analysis, Qualitative Analysis, Multipoint
Analysis. Standard sample

Supplier must ensure compatibility of EDS with FESEM.

14 General FESEM quoted must be complete in all respect with stage of art
technology. It should have capability to image thin films,
polymers, ceramics, semiconductors and magnetic specimen at
high mag. FESEM should have suitable technology for
optimum performance of all the detectors particularly In-Lens
SEI.

15 Warranty 3 Years warranty

Warranty should cover:

3. All parts including accessories and labour

4. Free maintenance and service
 ITEM NUMBER 06: TRANSMISSION ELECTRON MICROSCOPY
Require a highly versatile High resolution and High contrast Transmission Electron
microscope with high tilt capable of analyzing specimen at ambient temperatures with a
highly versatile platform for up gradation into analytical transmission electron microscope
like EDX (at cryo as well as ambient temperature), STEM, EELS, EFTEM, Tomography etc.
The system should be capable of analyzing all types of samples (biological, materials etc.)
provide all information and applications.

Vendor must substantiate the technical feature of the system with documentary proof and
send compliance statement of each and every feature. Vendor must high light the best
features other than the tendered features of the system

Essential Specifications

1 Feature Specifications

1 General Characteristics
2 Acceleration voltage
3 Electron Emitter
4. Resolution
Point Resolution (nm)
Line resolution (nm)
STEM Resolution
5 Vacuum System
6. Specimen chamber and
Stage:
State of the art High resolution TEM with specified high
resolution and tilt angles
Specify model quoted and provide product brochure indicating
the capability for future up gradation
20KV to 200 kV lower kV voltage (Preferable)as low as that
required for imaging and analytical analysis of samples like
STEM ( BF, DF & HAADF) imaging, EELS,EDX etc
Specify mode of variation to lower voltage - in steps and/or
continuous
Specify minimum step
HT Stability 2 ppm or better
LaB6 emitter
Filament operating hours counter
0.24 nm or better
0.14 nm or better
1.0 nm or better
Clean and Fast Dry Vacuum System
Fully interlocked differentially pumped column
Differential Aperture: specify the size (minimum aperture size
preferred)
Gun and column area pumped by separate Ion Getter Pumps
Built in anti contamination device
Minimum dose/low dose system
Specify approximate pump down time for the requisite level of
vacuum
Goniometer stage, fully computer-controlled, eucentric side-
entry, high stability
Maximized tilts for any X,Y,Z, and coordinates
Capable for accommodating a variety of
specimen holders such as low background
double-tilt holders, cooling holders, heating holders etc.
 X, Y movement 1 mm or more
Z movement 0.2 mm or more (preferred)
specimen grid size 3 mm
Drift 1 nm/minute with a standard holder
There should be inbuilt safety system to limit translation and
tilt to ensure that there is no damage of pole-piece, objective
aperture holder, specimen holder or any other parts when the
specimen is titled or moved, using all kinds of specimen
holders.
Capable of accommodating a variety of specimen holders
including low background double tilt holder
Specimen tilt 40 or more with specimen tilt holder
EDS solid angle 0.17 srad for silicon drift detector
7 Illumination modes High Magnification
Low Magnification
Diffraction (both micro- and nano-probes)
Dark field
8 Lens System Lens system should be highly versatile with maximum number of
required lenses at various stages capable of all analysis.

Condenser lens Standard Number and sizes

aperture
Objective lens Standard Number and sizes
aperture
Selected Area Standard Number and sizes
aperture
Number of Spot Standard Number of spot sizes (more numbers will be preferred)
Size Standard
SA Camera Length Standard Number and Size

SA aperture Coma free Objective lens alignment

TEM magnification range 25 X or less 700 kX or more
STEM magnification range 100 X or less 5 MX or more
Automation Auto gun
Auto adjust
Magnification calibration
Essential Detectors EDX
STEM (BF,DF, HAADF)
# Range of STEM magnification must be of
the order 150X - 2,000,000X or better
# STEM Bright-field (BF) and annular dark field(DF) detectors must
be available to collect BF and DF STEM images simultaneously
# High-angle Annular Dark-Field (HAADF) STEM detector must be
mounted above the viewing chamber for higher angle Scattered
electron collection and for easy detector alignment
# STEM HAADF resolution must be better than 1 nm
# Switching between STEM and TEM mode should be instantaneous
# It should be possible to operate any installed analytical techniques
 such as energy dispersive x-ray (EDX) spectroscopy simultaneously
with STEM (either HAADF or BF/DF detector).
# It should also be possible to mix two or more of these signals and
create composite elemental / composition maps.
Recording System Bottom Mounted embedded 2kx 2k Peltier-cooled CCD camera
CCD Camera system with electronic shutter.
Plate Camera # High Resolution CCD camera of minimum 2k x 2k pixelon CCD
# High Speed Camera# Scientific grade progressive scan sensor with
anti-blooming sensor architecture
Link Digital Interface for camera data transfer and control.
# Maximum viewing speed: Survey Mode >12 fps
# Facility for astigmatism correction at high magnification
# User-friendly software integrated with TEM system software for
image archiving and recall.
# Software and output images should be compatible with other
commercial image analysis software.
# On-line annotation for scale bar, magnification and TEM
conditions should be available.
# On-image facility for linear measurement & diffraction
Measurements for ring and spot pattern.
# Real-time FFT with spatial and temporal filtering.
# Camera should be High Resolution Scintillator type having
Digitization more than 16 bit
# Quoted camera should be EELS &Tomography Compatible.
#Microscope software should run seamlessly with future applications
such as True Image, Tomography, Low Dose
and Auto Adjust.
# CCD camera should allow selection of viewing mode, integration
time and readout area.
# The software should include on-line and off-line data processing
features like FFT and full support for real space (image mode) and
reciprocal space (diffract mode) and reciprocal space (diffraction
mode) calibrations.
Simultaneous analysis STEM + EDX
modes STEM + CCD
Cryo + EDX (for polymers)
Spare Parts and standards Should guarantee supply of spare parts for a Minimum of 7
years from the date of installation
All essential spare parts and necessary consumables required
for down time free operation of the equipment (TEM, EDX,
CCD etc.) for three years from the date of installation should
be quoted.
All relevant standards for demonstration and operation of the
total system should be quoted
Essential ancillary All essential ancillary equipments such as UPS as per TEM
equipment for break free requirements with 60 minutes back up , chiller, compressor etc.
operation
Essential accessories
1 EDX LN2-free silicon drift diode of 30 mm2 or higher crystal area with
Detector integrated peltier cooling
Energy resolution 129 eV or better
Detector retraction Windows/PC based software integrated (preferably
system embedded) with the TEM operating software should be
Software provided.
Elemental analysis and elemental mapping facility
The system software should have facility to track and correct
the image shift during longer acquisition time required for
critical mapping applications.
Calibration Should be software controlled
The EDX system should be supplied with hardware for EDX
mapping applications.
Interface Suitably interfaced with system software for high speed data transfer

Should have acquisition capability in different formats and elemental

Spectra acquisition identification during measurement

Automatic evaluation, qualitative elemental analysis, spectra

correction for background, deconvolution of spectra for separate
Spectra Analysis elemental contributions

Quantitative and semi-quantitative analysis using standard-less

analysis
Standard-less analysis
Comprehensive onsite Three years warranty
Warranty Warranty should cover:
(i) All parts including accessories and
labour
(ii) Free maintenance and service
(iii) Regular up gradation of software
AMC After warranty for a minimum of three years
Charges will be paid annually after expiry of warranty
Optional accessories
Vendors should quote the following optional accessories for TEM sample preparation.
Material sample 1. low speed Cutter
preparation Tools 2. Ultra sonic Disc cutter
3. Grinder/Polisher
4. Punching system
5. Electro Polisher
6. Ion mill system
7. Dimple Grinder
8. 8. Plasma Cleaner
9. 9. Ultramicrotome with knife maker and isolation table
Future Up gradation TEM should be fully upgradable for EELS
Site Engineer for operation and maintenance for HR TEM for
warranty period
 ITEM NUMBER 07:RF/DC Magnetron sputtering

RF/DC Magnetron sputtering system with automated process control for depositing thin film
multi-layers with following capabilities and specifications

Vacuum System: Vacuum chamber should be a rectangular or D-shaped box type made
of SS304 stainless steel (Leak tested down to 10-10Torr) with front access door. The size
of this box should be such that it can accommodate necessary view ports and all of the
other essential modules mentioned below.

Pumping System: The vacuum production should be based on an atleast 300 l/sair
cooledturbomolecular pump (Leybolds/Varian/Edwards/Pfeiffer) capable of producing a
vacuum of 1x10-6Torr in 30 minutes with a backing rotary pump (Leybolds/Varian/
Edwards/Pfeiffer) and a pneumatic gate valve. The process is expected to be carried out
in the pressure range of 1 to 100 mTorr, therefore an appropriate solution in the form of
throttling plate or related means should be provided.

Pressure Gauges: One inverted magnetron based pressure gauge that measures down to
1 x 10-9Torr (Leybolds/Varian/Edwards/Pfeiffer/Inficon/MKS) and one capacitance
manometer for measuring process pressure (Leybolds/Varian/Edwards/Pfeiffer/Inficon/
MKS).

Sputtering Configuration and sputtering Cathodes:

Sputter-up configuration: System should be designed for sputter-up

configuration.

Two number of two inch (or closest dimension to it) diameter magnetron cathodes
(preferably Angstrom Science) with possibility of both RF and DC operations. It
should also have the facility of adjustable distance from substrate, adjustable tilt
angle and a shutter.

The system should be upgradable to add two more magnetron cathodes in future.
Hence the system should be able to accommodate four magnetron cathodes.

Substrate holder and heater:

Rotatable substrate holder capable of holding substrates of sizes from one cm to one
inch diameter (up to 5 substrates are expected to be coated in a given run). Substrate
shutter should also be supplied.

Substrate heating up to 8000 C with necessary temperature monitor and controller. The
heater should preferably be a lamp based radiant heater (This may be used either for
in-situ or post deposition annealing of samples).
 The distance between substrate holder and sputtering source should be adjustable.
The minimum distance required is ~ 55 mm for the cathode.

Digital thickness monitor: A quartz crystal based digital thickness monitor with
necessary electronic modules, feedthroughs and arrangements should be provided.
Provision should be there for adjusting the position of the quartz crystal monitor. Some
spare crystals (at least 10 crystals) are to be supplied.

Power Supplies: One cathode is to be powered by a 300 W (or close it) RF power supply
(RFVII/Seren/Huttinger/Advanced Energy) with auto tuning and matching network. The
other cathode is to be powered using a DC power supply (1000 V and 1 A) with
adjustable arc suppression time, Voltage, Current and power regulation modes, digital
display of parameters etc.. (Note: The system should be suitable for running both supplies
at a time for co-sputtering. It should also be suitable for running two or more RF sources
simultaneously for our future applications.).

Automated Process Control: A two channel sequential deposition thinfilm controller

with necessary hardware and software should be supplied for facilitating multi-layer
depositions (Please mention additional cost if we opt for three or four channel controller).

Gas handling: Gas inflow should be controlled using two mass flow controllers
(preferably MKS): One for Argon and the other for nitrogen / oxygen.

Chiller: An appropriate ware chiller should be provided.

SS304 liners (Option al requirement): Removable SS-liners / jackets are needed to

minimize contaminations as this system is expected to be used by several users.

Power input should be compatible with Indian power system (230 V and 50 Hz AC).
Three phase connections should be avoided.

Vacuum and water interlocks should be provided and pump on/off should be integrated
with mains on/off.
 ITEM NUMBER 08:FTIR SPECTROMETER

SPECIFICATIONS OF FTIR SPECTROMETER

Mid-IR (KBr) beamsplitter 8,000-370 cm-1 Or Better

Spectral resolution 0.5 cm-1 or better
Wavelength precision 0.2 cm-1 or better @ 2000cm-1
Wavelength accuracy 0.1 cm-1 or better @ 2000cm-1
Signal-to-noise: Minimum 32,000:1 p/p @4 cm-1& 1min scan or better or 9300:1 for
single scan 5 sec peak to peak or better.
Michelson Interferometer for fast scanning, dynamic alignment changes due to a tilt
and shear, must have high reflectivity coated optics.
Vibration isolated baseplate of the instrument.
System must have automatic compensation for Vapor & carbon dio oxide
Desiccated optical unit with KBR Beam splitter.
Software operating the Windows XP operating,system, Basic and advanced data
manipulation routines Spectral calculator,Spectral comparison,PLS\PCR\Beers Law
predictions,Beers Law Quant method development,IR Tutorial, Report Builder,
Multimedia training CD.
Accessories to be offered by FTIR Manufacturer Only: demountable liquid cell for
liquid Sample transmission mode ,Holder , KBr Rectangular cell (Pk/2) 02 Nos.,
Assorted Rectangular Teflon Spacers (Pk/12), KBr Circular Windows, Adjustable
Adaptor for cell, Universal KBr pellet Holder.
Dessciants for 5 years of operation.
Diamond ATR accessories covering the entire range offered.
Local Accessories to be supplied : Suitable branded PC along with Printer, Suitable
On line UPS with 30 min backup, hydraulic Pellet Press 15 ton,Agater& Pestle
etc,KBr Die set
Warranty :One year
All specifications must be guaranteed along with printed authentic documents.
 ITEM NUMBER 09: Fluorescence Spectrophotometer

We intend to purchase SpectroFluorimeter with following technical specifications:

Wavelength Ranges:
Excitation: 200 nm 800 nm or better.
Emission: 200 nm 900 nm or better.
Spectral band width:
Excitation: 2.5, 5, 10 and 15 nm with 0.1nm increment or better.
Emission: 2.5, 5, 10, 20 nm with 0.1nm increment or better.
Wavelength Reproducibility: 0.5 nm or better
Wavelength Accuracy: 1.0 nm or better
Sensitivity: Minimum signal-to-noise level using the Raman band of water, excitation
350 nm, is 750:1 RMS measuring noise on the Raman peak, and 2500:1 RMS
measuring noise on the baseline.
Wavelength Scan Speed: In increments of 1 nm from 10-1500 nm/min; data should
also be collected with respect to time.
Photometric System: Computer-controlled rationing fluorescence spectrometer that
can measure fluorescence, phosphorescence, chemiluminescence, and
bioluminescence.
Should Include Single-position, water-thermostatted cell holder
Incorporates a software-controlled filter wheel in the emission monochromator
with 290, 350, 390, 430 and 515 nm cutoff filters, 1% T attenuator and clear beam.
Includes automated polarization accessory that consists of 2 filter wheels; each
wheel containing a horizontal and vertical polarizing element. Polarizer positions are
software controlled and can be manually set or automatically controlled for
polarization, anisotropy or G-factor
Includes sample compartment purge nipple to allow dry air or nitrogen to be blown
into the sample area to prevent the optics fogging for low temperature applications.
Light Source: Xenon flash-pulse lamp with long life time.
Detector: High performance photomultiplier detector
Slew Speed : 2800 nm/minute or better
Limiting Resolution: < 2.5 nm or better
Software Functions : Software for control data acquisition, graphical display, result
presentation, prints, data exchange between other windows Applications, spectrum
addition, subtraction, superimposition, spectral smoothing, normalization, derivative
spectra, peak search, kinetics, align, mathematical calculation.. The software provides
specific applications such as Scan, Time Drive, Ratio Data Collection, Well Plate
Reader and 3D view.
Accessory: Liquid sample Holder, solid sampling unit and various cuvette

Note: The above specification should be supported by a printed and authentic literature.
 ITEM NUMBER 10:UV VIS NIR SPECTROMETER

SPECIFICATIONS FOR UV VIS NIR SPECTROMETER WITH REFLECTANCE

ACCESSORY for highly reflecting powder sample.

The Double beam Spectrometer should cover the wavelength range 190-3300nm or
better
With fully controlled by external PC through Windows based software.
Should have all reflecting optical system (SiO2 coated) with holographic grating
Double monochromator with 1400 Lines/mm UV/Vis blazed at 240 nm and 360
Lines/mm NIR blazed at 1100 nm, Littrow mounting, sample thickness compensated
detector optics or better
It should have minimum 4 segmented chopper mechanism for dark current
compensation for sample and reference.
System must have photomultiplier detector, PbS detector and/or InGaS detector for
reflectance acc measurements.
The optical resolution should be 0.20 or better for the NIR range and for UVVIS
should be atleast 0.17 nm or better.
Stray light should be less than 0.0001 %T at 220,340 and 370nm as per the ASTM
methods.
Wavelength accuracy should be less than 0.16 nm for UV-VIS range and 0.5 nm
for NIR range.
Photometric accuracy at 1A should be +/- 0.0012A or better.
Photometric Reproducibility at 546.1 nm and 1A should be 0.0008 A or better.
Photometric Range must be at least 6 A or better
Photometric Stability 0.0002 A/h peak to peak or better
Baseline Flatness 0.00015 A (190 to 3000 nm or more) or better.
Cuvette for Liquid sample is to quote.
The software should be capable of performing following functions:
Fully integrated Scan, Timedrive, Wavelength Program data collection modes
included with real-time spectral display and live instrument and accessory status bar.
Quant and Scanning Quant applications, optimization of calibration curves,
calibration lifetime and calibration acceptance criteria. Methods comprise instrument
and accessory parameters, sample table, spectral processing, math calculations,
conditional results checking, report template. Password-protected method security..
Results and reports are created automatically as defined by the method when an
analyst runs or reprocesses data. A secure, encrypted relational database is used to
store all data created. .

Suitable PC-Printer and online UPS is to quote for operation of the system.
 ITEM NUMBER 11:Focused Monomode Microwave Synthesis System

Tender Specifications

The system must be able to insure efficient operation for the synthesis of compounds in a
sealed vial for volumes up to 10 ml, & under atmospheric conditions (Open Vessel reaction
under reflux condition) in flasks up to 125 ml.
The system must be compatible in size to fit and work inside of standard fume hoods.
The system must be single mode microwave applicator design and provide a uniform field
with a high power density of at least 900 watts/liter. The system should have minimum power
output of 300 watts.
The System must feature a power delivery system that automatically adjusts during the
synthesis procedure for changes in the polar and/or ionic properties of the reaction mixture.
The System must incorporate the ability to simultaneously apply microwave energy while
cooling the reaction environment. This capability permits reactions to be performed that
require high energy input at lower temperatures.
The System must feature a cooling capability to quench reactions at the end of the synthesis
procedure.
The System must have a built in controller to operate without an external controller.
The System must have an in situ stirring system to affect the stirring of the reaction
The System must have non invasive IR sensor for Temperature Measurement. The system
must have temperature range up to 300 C. It must feature a sensor positioned under the
cavity floor so that the temperature measurement is independent of sample volume and
reaction container size.
System must allow the user to change all operating procedures in the midst of the run.
The System must have the ability for Pressure Measurement and Feedback Control. Itmust
use a vent and re-seal technology that allows for safe venting of excessive pressure.
The vial sealing system should provide a high-pressure seal {>20 Bar (300 psi)}
The System must also allow the automatic and safe relief of residual pressure and normalize
the reaction vial immediately after the reaction procedure concludes.
The System must incorporate a design such that the System can accept various applications
specific instrument modules, such as automation modules, solid-phase peptide synthesis
modules, spectroscopy modules or scale -up modules, to upgrade the base System. All
modules must be forward and backward compatible throughout the product line.
The System must have a removable, protective liner to handle spills in the cavity.
Optional
System must have ability to perform sub ambient (up -800C) and hydrogenation reactions.
System should also have option to perform reaction in a 80 ml closed vials.
Please quote above mention accessories as optional items.
 ITEM NUMBER 12: Confocal Raman Spectrometer

Tender Description
Tender for the supply, delivery, installation, testing and commissioning of one unit of
Confocal Microscopy, MicroRaman (Raman Imaging), Raman Spectroscopy along with
Photo Luminescence Imaging System having option for Atomic Force Microscopy &
Scanning Near Field Optical Microscopy (SNOM), all in a single system with common
controller and platform.

TECHNICAL SPECIFICATIONS
1. Confocal Microscope and Raman Imaging
1.1. Research grade confocal microscope with 6x turret.
1.2. Sample size: 120 mm in x and y direction, 25 mm in z direction. Should be adaptable to
fit larger sizes in Z direction.
1.3. Motorized z-stage system, automated approach, 30 mm travel range, single step size
10nm.
1.4. Lasers coupled to microscope using single mode fibers.
1.5. Objectives 20x, 50x & 100 x (minimal and additional with detailed specifications to be
offered separately)
1.6. Confocal microscopy in reflection with diffraction limited lateral resolution ~ 250 nm @
532 nm excitation
1.7.Raman imaging with error-correction based on closed feedback loop of scanner.
1.8. Scan range 200 m in x and y directionwith good position accuracy
Optional:3D imaging and depth profile based on confocal configuration.

2. Spectrometer
2.1. Spectrometer with >60% transmission (or better) @ 532nm.
2.2. Fiber coupled to microscope. 25, 50, 100 micron fiber.
2.3. Spectral resolution approximately one wavenumber pixel to pixel. Peak position
accuracy 0.02 wavenumber.
2.4. Lens based spectrometer
2.5. Focal length 300 mm
2.6. Molecular (Chemical) information less than or equal to 200nm laterally
2.7. Gratings optimized for visible range

.
3. CCD
3.1. Back-illuminated CCD detector,
3.2. peak QE > 90%,
3.3. Minimal 1024 x 127 pixel format.
3.4. flexible and highly sensitive confocal signal detection and guidance with multi-mode
optical fibre

4. Lasers
4.1. 532 nm
4.2. 40mW power at laser output
4.3. Single mode fiber with angled FC connector
5. Controller

5.1. Flexible and expandable digital controller based on a single Field Programmable Gate
Array (FPGA) chip
5.2. Fully digital feedback control
5.3. True Scan dynamic position error correction
5.4. High speed overload protection for photon counting detectors
5.5. Two free FPGA slots for future extensions
5.6. 80MHz FPGA

6. Extended PL Module

6.1. InGaAs Detector with analytical range 0,8bis 1,7m.

6.2. peak QE > 80%
6.3. Operating temperature -65o C with TE-cooling
6.4. 1024 x 1 pixel format
6.5. pixel-size 25 x 500
6.6. A secondary Spectrometer with focal length 300 mm
6.7. SMA optical fiber connection
6.8. Two optical gratings - 300 lines/mm with 1,25m blaze, 150 lines/mm with 1,25 blaze
(optional third grating)
6.9. Close cycle refrigerator with temperature controller (10-300K range)

7. Computer
7.1. 1 Computer with the latest configuration
7.2. Two(2) identical 19 LCD monitors.

8. Installation and training

8.1. On-site Installation and Training by an experienced engineer. Three years warranty from
the installation date
 ITEM NUMBER 13: Thermal CVD

Specifications for Thermal CVD

An Integrated Thermal CVD Vacuum Processing and Annealing System for processing
advaced materials, such as carbon nanotube (CNTs), graphene, Zinc Oxide, etc. The
system should be consisting of:
1. Vacuum Furnace
- Vacuum better than 5 X 10-2Torr with mechanical pump and better than 10-5Torr with
Turbo Molecular Pump (for future upgrade)
- Digital Pirani Gauge
- High vacuum plumbing with high vacuum valves wherever required
- Wide pressure range control configuration with controlled flows of gases through mass
flow controllers
- Tube Material- QUARTZ
- Tube Size - 60mm OD X 1000mm length
- Temperature - 1100C or more
- Heating Zone Length- 18
- Temp. Controller- Programmable (manual and software controlled)
- Max Heating & Cooling Rate - <30 C/min
- Software and manual controls
- Laptop with software to programme and control the vacuum furnace temperature

2. High Quality Mass Flow Controllers 3, with gas manifold and high vacuum valves.
The MFCs response time ~ 1 sec

3. Electronic Pressure controller for automatic control of the set pressure with a self
contained closed-loop electronic system with baratron full scale pressure range of 1000
Torr.

4. A double stage Rotary Pump with speed better than 5 m3/hr, intake/exhaust port of
KF25 and ultimate vacuum ~ 10-3 Torr

5. Electrical control panel for the complete system with Emergency switch and interlocks
for safe operation of the system

6. Basic recipe for growing CNTs with substrate

7. A spin coater (optional)

8. Installation and training

9. Process support to grow various materials by Thermal CVD

10. A suitable UPS with 15-30 min batter backup to run the complete system (optional).
 ITEM NUMBER 14: Scanning Probe Microscope (SPM)

SPECIFICATION for Scanning Probe Microscope (SPM)

A high-resolution imaging system consisting of a Scanning Probe Microscope (SPM)
capable of Nanolithography, Nano-manipulation, and Multiple Modes Imaging Techniques
(AFM & STM)
The following minimum instrument specifications are required. The instrument should be
upgradeable and all possibilities of up gradations should be clearly stated.
The quoted system should have following modes as necessary available.

1. Measuring modes:
Following measuring modes should be provided by offered specification of device:
1.1. Contact mode
1.2. Noncontact and semi-contact mode
1.3. Lateral Force Microscopy
1.4. Phase Imaging
1.5. Force Modulation Microscopy (Viscoelastisity)
1.6. Adhesion Force Microscopy
1.7. AFM Lithography Voltage and Force
Nanomanipulation
1.8. Magnetic force microscopy
1.9. Electrostatic force microscopy
1.10. Kelvin Probe Microscopy
1.11. Piezo Response Force Microscopy
1.12. Spreading Resistance Imaging (30pa-50nA)
1.13. AFM/STM spectroscopies (F-D, I-V etc.)
1.14. Force-Distance curves capabilities
1.15. Scanning Tunneling Microscopy (30pa-50nA)

2. Scanning Probe Microscope (SPM)

2.1. Must be able to perform vertical engage, where the scanner moves in such a way to
eliminate lateral translation of the tip during engage.
2.2. Must be a modular design construction to enable future up gradation with different
heads and accessories for multiuser facility.
2.3. Sample size must be up to 40 mm diameter and up to 15 mm height or more.

Possibility to use AFM head in stand alone mode separately from the main system
will be considered as an advantage.
2.4. Must include integrated top view optics and optical microscope with real-time color
video display / image capture and cross hair (inside the AFM software).
2.5. Must include temperature and humidity sensors to monitor control of atmosphere during
the measurements
2.6. Compatible for operations in low vacuum (10-4 Torr) is an additional advantage.
2.7. Must be a sample scanner system while tip maintaining its XYZ position relative to laser
and photodiode fixed. Possibility to use additional measuring head for the tip scanning with
fixed XYZ position of sample is considered as an advantage. Please quote optionally for
appropriate measuring head if available.
2.9 Scanners should be of piezo tube construction for highest resolution. Flexure stage based
system will not be considered.

Two scanners are needed

Small scanner:
Scanning Range : < /= 1x1x1 um (+/-10%)
Non-linearity XY, %
Fast Direction : 0.4
Slow Direction : 0.8
Drive resolution : 0.0004nm
Z RMS noise in 1000Hz bandwidth :< 0.03 nm
XY RMS noise in 200 Hz bandwidth : 0.005nm
Large area scanner:
Scanning range : 10010010 um (+/-10%)
Non-linearity XY :0.1% peak to peak
Non-linearity Z :1%
XY RMS noise in 200 Hz bandwidth (with capacitance sensors) : 0.1 nm
XY RMS noise in 200 Hz bandwidth (without capacitance sensors) :0.01 nm
Z capacitance sensor RMS noise in 1000 Hz bandwidth :0.03 nm
Z RMS noise in 1000 Hz bandwidth (with capacitance sensors) :0.05 nm
Z RMS noise in 1000 Hz bandwidth (without capacitance sensors) :0.04 nm
Drive resolution: 0.006 nm

3. Performance capabilities:
Kelvin Probe Microscopy mandatory measuring mode with all required hardware and
software. The system must enable different measuring capabilities of Kelvin Probe including
Single Pass mode based on multi-lock in detection, where KPFM signal is recorded
simultaneously with sample topography during one scan without lifting the tip and repeating
the topography profile. Although the classical Kelvin Probe based on two pass method with
lifting the tip from the surface in the second pass should also be available.
PiezoResponse Force Microscopy - mandatory measuring mode with all required hardware
and software. The system must enable different measuring modes including imaging of
amplitude and phase signals of vertical and lateral piezoelectric domains. The system must
offer comprehensive measurements of hysteresis loops and PFM spectroscopy. The system
should also offer software or hardware implementation for compensation of mutual cross-talk
of the vertical and lateral signals from photodetector that will minimize cross-talk in the
imaging of lateral and vertical domains accordingly.
Raster Spring Imaging or equivalent measuring mode a topography measuring mode
with minimized lateral interaction of tip and sample for measurements of soft and delicate
objects. The vertical approach of the tip to the sample must stop when interaction force
reaches its predefined setpoint value and then move back. The lateral translation of the tip
relative to sample is made only far away from the sample surface thus minimizing the lateral
forces. Simultaneously with topography mapping this mode should also enable quantitative
maps of other mechanical properties such as adhesion map or yang modules.

4. Optical video system

Top view optical system with possibility to observe cantilever and sample. Side view
possibility to control tip to sample approach process is desirable.
Resolution 1um or better
Maximum field of view 4.5x4.5 mm or better
Magnification on LCD screen 5000x or better
Color CDD camera and LCD display 20 monitor
5. Active Vibration Isolation Table : Active damping (0.6 to 200 Hz and passive >
200Hz. Load capacity: 100kG max. Tabletop dimension: ~ 450 x 400mm.

6. Controller
USB 2.0 connectivity
Fast DSP 320MHz floating point or better
Three 16 bit DACs for each channel (X,Y,Z). in total 9 DACs.
Two 16-bit DACs for user output
Capable to image 8 independent signals simultaneously in one trace and up to 16
signals on trace and retrace.
Up to 8000 x 8000 data pixels
10 ADC of 1MHz, 18-bit
Switchable 500KHz DAC, 18-bit (5 channels with software controlling gain
amplifiers 1,10,100,1000). Individual digital filter on each channel.
6 digital Feed Back loops
Integrated closed loop control
2 broadband lock-in amplifiers: up to 5MHz each, 0.1Hz resolution
3 low frequency lock-ins: up to 10KHz
Digital generators with 32 bit frequency resolution driven by high-speed 80 MHz 14
bit DACs
Low voltage operation
16-bit DAC for Bias Voltage control
12-bit DAC for user output
5 external inputs for user flexibility
Supports signal access module (break-out box) for user defined experiments and
access to all signal
Self-diagnostic board for automatic testing of the system
7. Software
7.1. Automatic cantilever spring constant calibration required
7.2. Graphical User Interface within software for customized force Measurements: enables
design of complex force experiments, implementation of Macro routines etc. Scripting
support of user-defined force curve paths. Users have immediate access to all other
microscope functions because the interface is self contain within the software and is not an
external package. Powerful off-line export and processing tools.
7.3. Free life-time software update

7.4. Image analysis Windows-based (preferred) software should include at least

following features:
- Cross section analysis
- Roughness measurement
- Grain size analysis
- Depth analysis
- Power spectral analysis
- Histogram analysis
- Fractal analysis
- Fourier analysis
- Image mixing
- Autocorrelation
- Enhanced image filtering tools
7.5. Image modification and presentation software should include at least following
features:
Force-distance curve analysis
- 2D Fast Fourier analysis
- Plane-fit
- High pass and low pass filters
- Zoom in/out
Optional grid on images and curves
- Variable shading and display angle, tilt
- Color bar completely user definable 2D and 3D height presentation
- Menu for image series presentation
7.6. Image and data export format at least:
- Export to BMP, JPG, TIFF and export to ASCII format and MatLab
7.7. The software must include macro language scripting possibilities for optimization of
routine operations and user-defined experiments
7.8. Must include automated system configuration for operation in liquids to operate these
modes
7.9. Must include automated system configurations for advanced modes like SKM, MFM etc.
7.10. Software must be a sole package for all modes and attachments with no need for
additional software programs.
7.11. Software package must include both image acquisition and data processing software in
one package
7.12. Software must be free-for copy, e.g. can be installed on unlimited number of off-line
PCs
8. Spare parts and accessories:
The offered system must include all necessary toolkits and accessories for AFM and
STM including screwdrivers, tweezers, and sample plates e.t.c. The offered system must
include a set of calibration gratings for scanner calibrations in X,Y and Z in the range of few
Angstroms to few Microns.
The set of supplied cantilevers must include at least the following probes:
10 chips - for contact AFM;
25 chips - for intermittent contact AFM;
5 chips - for SSRM;
5 chips - for SKM/SCM;
5 chips - for MFM
10 chips for Piezo Response Force

9. Manuals:
Complete set of service manual for diagnostics, trouble shooting and maintenance should be
provided on DVD/CD disks with free copy lisence.

10. Warranty:
The complete system should be warranted for 36 months from the date of commissioning at
site. Warranty should cover:
1. All parts including accessories and labour
2. Free maintenance and service

11. Options:
1. Liquid cell: appropriate liquid cell for AFM measurements under liquid media. The
cell must enable optical access to the tip sample also.
2. Mode to do Research in Elasticity :
Offered system can able to do research in Elasticity, have the technique for local elasticity to
provide direct imaging of polymer domains and texture as well as direct measurement of Youngs
Modulus. Need to offer relevant mode of microscopy with the sample actuated by piezoelectric
transducer which emits acoustic waves into the sample. The surface vibrations are transmitted into
cantilever via the sensor tip.

3. Scanning Thermal Microscopy:

Hardware and software package for Scanning Thermal Microscopy measurements
with required controller, probe holder and related accessories. Must enable thermal
conductivity measurements simultaneously with topography mapping.Temperature range
from RT to 160 with resolution 0.1.
4. External Magnetic Field:
i) Must include Scanning Measuring Head made of Non-Magnetic materials for operations in
external magnetic field
ii) Must include External Magnetic field Generators integrated into the SPM system:
In-plane Variable Magnetic Field: +/- 0.35 T. This generator must include exchangeable
magnetic poles of different geometry.
Out-of-plane Variable Magnetic Field: +/-0.05 T. It must be possible to use this generator
in low vacuum also.
These generators must be controlled through the same software
During the measurements in external magnetic field the system must operate as a Probe
Scanning System with no any motion of the sample for proper data acquisition.

5. Vacuum Attachment:
In order to remove water layer from the surface, increase sensitivity measurements
and enable controlled homogeneous environment around the sample during SPM
measurements the system must be equipped with compatible vacuum pumping/gas injection
system:
SPM base system must be hermetic and allow for connection to external vacuum pumping
station and gas injection
SPM base system must have inbuilt industry standard flanges for connection to external
vacuum pumping station
. While operating SPM system in low vacuum/gaseous atmosphere there must be optical
access to the tip and sample
XY motorized sample positioning must be possible while operating SPM system in low
vacuum/gaseous atmosphere
Vacuum pumping station must include appropriate pumps, vacuum gauge, shutters,
flanges, gas injection system and all necessary accessories.
Vacuum pumping station must allow for down to 5x10-4 Torr operation
This station must not limit functionality of the SPM system, e.g. allow for sample and
probe scanners operation, simultaneous use of heating stages and other SPM accessories.
Closed loop scanning is essential for SPM system operation in low vacuum also.

6. Nanoindentation :
- Hardware Nanoindentation
- Maximum load, which is ~ 30 150 mN
- Nanoindentation head with optical force displacement sensor
- Modes of operation: Surface topography, hardness and local coefficient of elasticity
mapping;
Nanoindentation and Scratching;
- Hardness measurement in the range 1-100 GPa
- Young Modulus measurement in the range 1-1000 GPa
- Berkovich diamond probes (with tuning fork sensor)
- Stiffness 10-15x103 N/m
- Stiffness 10-15x103 N/m

Confocal Raman:
Scanning Probe Microscope with integrated scanning confocal scheme in combination
with regular AFM and spectrometer to detect Raman scattering spectrum.
 ITEM NUMBER 15: VACUUM FURNACE

TECHNICAL SPECIFICATION for Table TopHigh Temperature Vacuum Furnace up

to 2000C

Should be high Temperature Vacuum Top loading Furnace with Non-

Magnetic Metallic Furnace body , using Tungsten Heating element.
Max. Temp. up to 2000C and working Temp. up to 1900C with fully
automatic Temperature control system,
Special arrangement for gas inlet and outlet facility and should be operatable
under pressure, 25 CFF port for Vacuum pump connection.
Top opening door with View port & Pyrometer port.
Heating cavity size: 150mm(width) X 150 mm(height) X 150mm(depth)
Charging capacity should be minimum 50 g of Aluminum alloys or 100 g of
steel samples with removable type of sample carrier made up of Tungsten.

DETAIL OF HEATING ELEMENT:

Tungsten Heating Element.( Round Rod shape) Suitable for Operating Temperature
up to 2000C. Suitable ceramic fixing clamp & holder should be provided.
Digital PID Microprocessor based control Temperature Controller with accuracy
1oC.
Dwell type digital display one for furnace set temperature indication and another for
actual furnace temperature indication. InputThermocouple W5%Re vs W26%Re,
Type C Range up to 2200 C with Tunsten coated sheath.
Control Output 0 to 5-10 V DC. For SCR power Drive.

With 1 Segment programming facility for heating rate control along with automatic
fault Indication & RS232C Interface.
Over Temperature Alarm with light indication.

THYRISTOR POWER DRIVE:

PHASE ANGLE control Thyristor power drive for long life and safe guard of heating
elements
and for high accuracy and power save. Along with voltage control and Limit facility.
1.5 times higher from actual furnace load.
POWER SUPPLY: Input Supply 415 V AC 50 HZ, 2 / 3 PH + Neutral. Load: 8.4 Kw. (
Approx.)

STRIP CHART RECORDER: CHINO make multipoint Microprocessor based control

temperature recorder should be provided with accuracy 1o C. with Digital Display and
Programmable Universal Input. Speed should be Selectable
TRANSFORMER:

Air Cooled Type step down Transformer, suitable for Thyristor Drive.
 Rating: 1.5 times higher Volt. 400V + Neutral .

THERMAL INSULATION: ( 2000C )

Combination of Polished Tungsten ( 4 layers ) & Moly shields (2 layers).

On all furnace surface. & Next Air Insulation to ensure best performance during
Continuous operation.

OPERATING TEMPERATURE:
Max. 2000C for short period.However, 1900C for continuous operation.

TEMPERATURE UNIFORMITY: 3-6o C or better.

HEAT UP TIME:

Rate of Heating: 1C to 12C/min approx.( Variable ) or less to reach max. temp.

Cooling rate from 1900oC to 1000 Deg at 5 Deg C / min or high

CONSTRUCTION:
Upper Part Furnace and lower portion Control Unit or Table Top Furnace mounted
with
Heavy channel welded frame & separate control unit should be provided side by side.
Furnace body temperature not over 50o C. at 1900oC operational temperature.
FURNACE SHELL:
Horizon Top / Front opening type S. Steel ( SS-304L) cold wall with 4mm thick outer
shall and 6mm inner shell with water circulation round the total furnace body, door
opening with adequate vacuum proof gas tight sealed water cooled system, provision
for gas inlet, 25 CFF Vacuum port with Isolation Valve, pressure relies valve and
safety valve suitable capacity of 2 PSI pressure inside the chamber.

Furnace (Vacuum Chamber) should be fabricated as per ASME code Section VIII,
Div 1.

And all the O-ring should be of Viton material.

SYSTEM OF DOOR: Manual operated mechanical movement system for easy opening &
closing, along with all side extended flange with O ring fitted.

VACUUM SYSTEM:

Ultimate vacuum should be of lower than 10-2torr using direct driven rotary pump with
necessary required accessories.
Solenoid isolation valve and automatic Gas inlet to the pumping for safety.
Gas inlet connection to the furnace chamber with purge solenoid valve and safety
relief valve to purge inert gas along with Pirani gauges etc.
VIEWING PORT: Suitable design 5-8 mm Dia. silica glass cover double wall water/Air
cooled viewing port , shall be provided for continuous display inside the chamber, in hot
condition,

INERT GAS HEATING (under partial pressure)

The Furnace shall be capable to operate with Inert gas Heating, i.e. N2, H2, & Argon etc.

GAS CONTROL UNIT:

Suitable gas charging unit along with, Gas flow meter for 1 gas, precision needle control
valve,
Non-return valve, with necessary pipe line and other accessories etc.

CONTROL UNIT & ELECTRICAL ACCESSORIES:

* Digital PID Programmable Controller --------------------------------------- 1 Unit.
* Over Temp. safety controller -------------------------------------------------- 1 No.
* Air Cooled type step down transformer ------------------------------------- 1 No.
* Thyrirstor Drive for Power control ------------------------------------------- 1 Unit.
* Ammeter & Voltmeter -------------------------------------------------------- 1 set.
* Push-button + Contactor ( for main ON / OFF system ) ------------------ 1 Unit.
* Cooling fan ( Fitted with control unit ) ------------------------------------ 1 No.
* Fuse unit with 5 no. of fuse ---------------------------------------------------- As
required.
* Indicating lamps ---------------------------------------------------------------- As
required.
* Thermocouple complete set --------------------------------------------------- 1 No.
* Limit Switch --------------------------------------------------------------------- 1 No.
* Gas Control Accessories ------------------------------------------------------- 1 Unit.

SAFETY PRECAUTION:
Following things must be provided along with the furnace:

Digital Safety Controller for over Temperature Protection.

Safety Fuse, for over power Protection.
T.C. Broken Indication with automatic trapping.
Water flow protection. With Alarm
Door Limit switch with power interlock
H2 Gas Burning system with Flash back protection.

Two set of drawing, electrical circuit diagram operation manual shall be supplied with
equipment.
Essential spares for two years normal operation should be separately quoted.
List of customers in India along with phone numbers and email addresses. Also, indicate
the level of training for local service capability in India and indicate the typical response
time for service.
 ITEM NUMBER 16: Microwave furnace
Technical specification
Micro-oven rectangular in shape 300 mm X 450mm X 350mm mm made of ASTM A
240 304Lmaterial.
Operating temperature up to 1000oC.
The pumping system consists of diffusion pump with liquid nitrogentrap and 4"
butterfly valve used as high vacuum isolation valve.
2nos of 1" valve used one of roughing and another one for backing.
250Lts/Min rotary pumpshould be attached to the diffusion pump with Pirani Gauge
digital and penning gauge.
Magnetron source will be one kilowatt with Rtype thermocouple.
 ITEM NUMBER 17: Planetary Mono Mill

Technical Specification
Maximum Feed Size: 10mm
Final Fineness < 1m
Minimum Sample Quantity: 10ml
No. of Bowl: 2 bowls of 250ml
Gas Pressure and Temperature measuring system
Diameter of Balls: 10mm
Bowl and Balls of Hard metal Tungsten Carbide and Stainless Steel

Other Specifications and required features

Effective Diameter of main disk: 121.6mm

Rotational Speed of main disk up to 650rpm
Maximum Speed of grinding bowls should be 1183 rpm
High energy milling up to 29g
Short milling times
Dry and Wet grinding possible
Bench top model with high grinding performance
The mill should have facility of continually monitoring and recording the data
of gas pressure and temperature during the grinding process.
Possibility to add additional Lock System and /or special lid for grinding in
inert atmosphere
Transmission ratio should be 1:-1.82
Cooling of the grinding chamber with a built in fan for long grinding times.
Programmable interval and break times
Easy cleaning of the grinding elements.
List of customers in India along with phone numbers and email addresses.
Also, indicate the level of training for local service capability in India and
indicate the typical response time for service.
Three years warranty from the date of installation.
 ITEM NUMBER 18:DYNAMIC MECHANICAL ANALYSER (DMA)

We intend to buy computer controlled Research Grade Dynamic Mechanical Analyser to

characterize solid bars, elastomers, soft forms, thin films, fibres, composites, Rubbers,
powders, Gels etc. with Windows based software with following specifications

SPECIFICATIONS FOR DYNAMIC MECHANICAL ANALYSER (DMA)

Various deformation modes should include hardware for 3-point bending, tension,
Compression, Single cantilever, Dual Cantilever and Shear modes should be included.
Rotational analysis head with 45 degree change. With very easy sample loading,
Built-in TMA mode should be available. The coefficient of thermal expansion (CTE) can
be determined with this mode. In addition to operation in dynamic mode, the DMA should
permit operation in a constant force vs. time or temperature (TMA) mode. Applications
such as expansion coefficient, softening and penetration, or extension or contraction in
tension geometry should be possible.
Detector: LVDT
Frequency Range from 0 to 300 Hz.max. with 100 frequencies per experiment
Temperature Range from 190C to 400C or 600C or better
Modulus Range : ~103 to 1016 Pa with Resolution 0.0001 Pa or better
Tan Delta resolution : 0.00001 or better
Liquid Nitrogen consumption less than one litre per run
Displacement range : + 1000 with 1 nm resolution
Heating and cooling rate : 0.1 20 C/min or better
Force Range : + 10 N
Should be upgradeable to humidity studies.
Should include Fluid bath for immersion studies.
Material packets should be included for powdered or non-self supported materials, such as
powdered drugs, gels, natural products like tea, coffee, herbs, etc. and low viscosity
materials, to be investigated by DMA.
Time-Temperature Superposition software should be included. It should allow
manipulation of frequency scan data to generate Master Curves.
Locally required Suitable Branded computer & Printer and Nitrogen Purge Gas Cylinder
with Two stage Gas Regulator should be Included.
Vendor has to quote all the necessary pre-installation requisites required for the complete
installation of the system.
 ITEM NUMBER 19: Ultra Low temperature bath
Technical specification:

Working temperature range (C) -90 to+100oC

Temperature stability (C) 0.02
Setting / display resolution 0.01 C
Integrated programmer 1x10 steps
Temperature Display VFD
Heating capacity (kW) 1.3
Cooling capacity (Medium Ethanol):
20C 1 kW
0C 0.92 kW
-20C 0.88 kW

-40C 0.75 kW
-60C 0.58 kW
-80C 0.2 kW
Pump capacity flow rate (l/min) 11-16
Pump capacity flow pressure (bar) 0.23-0.45
Bath opening / bath depth (W x L / D cm) 13 x 15 / 16
Pump connections M10x1
Barbed fittings diameter (inner dia. / mm) 8 / 10
Filling volume (liters) 8
Refrigerant R404a R508B

VFD COMFORT DISPLAY

Keypad for setpoints, warning/safety values and menu functions
PID3 cascade temperature control
ATC3 3-Point-Calibration
Pt100 External sensor connection for measurement and control
SMART PUMP, electronically adjustable pump stages
Early warning system for low liquid level
Adjustable high temperature cut-out, visible via display
RS232 interface for online communication
Integrated programmer for 10 program steps
Active Cooling Control
 ITEM NUMBER 20: Glow Discharge Optical Emission Spectrometer

Technical Specification for Glow Discharge Optical Emission Spectrometer

Optics:Horizontal-centered sphere with convex grating
Detector:Charge-coupled array with 12,000 active pixels (0.007 mm W x 0.2 mm H)
Spectral Range:Complete spectral coverage (165 nm to 460 nm)
Dispersive Focal Length:0.225 m
Source:2mm and 4 mm diameter DC glow discharge
Vacuum System:Two stage, direct drive vacuum pump for spectrometer and source
with air bleed to preventpump oil vaporization
Capable for quantitative chemical analysis of Plain carbon steel, Boron Steel,
Stainless Steel, Magnesium based alloys, Aluminum based alloys, Copper based
alloys, Nickel and Cobalt based shape memory alloys, Titanium based alloys
ITEM NUMBER 21: SPECIMEN PREPARATION FOR OPTICAL
AND ELECTRON MICROSCOPY

ITEM No. 21A. ION BEAM MILLING SYSTEM

A compact, self-contained, bench-top ion mill system having ease of use and low
maintenance.
Suitable for all types of materials (semi-conductors, ceramics, multi-phase metals,
composites, high Tc Superconductors, etc.).
All the functions should be controlled through an intuitive color touch screen
display.
Ion Source
Containing two Penning ion guns each with independently adjustable gas control
utilizing mass flow controllers to permit either rapid milling or slow precise ion
polishing.
Ion beam energy: adjustable from 100eV to 8keV.
Beam width at the sample: no larger than 400m FWHM for standard guns
The milling angle: continuously variable from +10 to 10 and fully adjustable
during operation.
Motorized guns should be controllable through the graphical user interface.
The ion guns shall have no consumable parts and gas throughput should be less
than 0.1cc/min per gun at 8keV
The current range should be variable from 0 to 100 micro Amps.
The current should be measurable for each gun independently and measured at the
gun.
Special Operational Mode available for preparing cross sectional samples for
TEM Analysis.
Stage and Specimen Holders
A specimen exchange mechanism should be incorporated in the system to permit
loading or unloading of samples without venting the work chamber to
atmosphere.
Minimum specimen exchange time: 1 minute (or less) to unload a specimen, load
a new sample, the ion beams turned on (gas, voltage, current stable), and milling.
The Stage should incorporate X, Y motion to assist the user in positioning the
specified mill location at the center of the beam polishing area. The minimum
stage travel shall be +/-0.5mm ( (i.e. 1mm in total ) in X and Y directions.
Sample holder material options should include at minimum: graphite,
molybdenum, and copper.
 The specimen holder attached to the exchange mechanism should be available to
optimize ion milling with or without cooling the specimen.
Specimen heating: A glue-type specimen holder should be supplied to optimize
heat dissipation.
The stage should be equipped with a rotational stage utilizing an encoder. The
readout of this encoder should be displayed on the Touch Screen Interface in
degrees.
Rotational speed: continuously variable from 1 6 rpm (12 rpm through the
inactive sectors when using Beam Modulation.)
Sector milling over a range of 5 to 90 degrees should be available and set via the
Touch Screen.
During Sector milling, only one gun shall be milling during each sector.
Cold stage should offered following standard specifications:
o Dewar and conductor rod should share the main vacuum system
o 6-8 hour Dewar capacity
o Sample temperature: -120OC (+/-25OC)
o Electronic temperature regulation: minimum range (-180OC to +
100OC)
o Through transmission illumination of sample
o Built in Dewar heater
Specimen Viewing
In-situ viewing: Any time without shutting down the ion guns or raising the
sample into the airlock.
Shutter: An automatic shutter should be provided to reduce window
contamination when not viewing the specimen.
Sample illumination: Reflection and through transmission with the intensity set
via the Touch Screen.
Sample viewing: as standard- Magnification range: 40X or 80X using
stereomicroscope
An optional Digital CCD imaging system with a minimum of 5Mpixels shall
provide real time viewing on a desktop computer. The camera system shall be
controlled by software. Operator shall be able to view the sample live, acquire
single frame images, or acquire multiple images automatically during the milling
process. ( Optional Item )
o Image storage: (Minimum of two formats)
o The camera should have the ability either in recipe mode or manual
mode to change the image capture sequence from every rotation to
programmable. This should be accomplished via the Touch Screen or
system PC.
 o Playback: While running the system and capturing images, the system
should be able to play back the previous 10 captured images.
o The system should be able to capture images while displaying a live
image.
The operator should be able to start, stop, or pause the milling process from the
system
Milling Termination
Milling termination by elapsed timer or optional light operated Auto-Terminator.
User Interface
A 10 color touch-screen graphical user interface (GUI) will be supplied as
standard. The GUI must be located on the front panel of the system for easy
access and viewing. All system functions (gun settings, gas flow controls, stage
movements, etc.) shall be controlled through this screen.
Multi utilization of Argon Voltage/Current Voltage should be possible either
automatically (all the way through perforation) or semi automatically (after
completion of high voltage milling.)
The system must provide the capability of stopping the milling process for user
confirmation before proceeding forward onto subsequent steps.
The Argon gas flow shall be automatically optimized and available prior to and
during the milling process: For each accelerating voltage and for individual gun
Vacuum System
The vacuum system should be totally oil-free (2 stage diaphragm pump backing a
70 liter/second Molecular Drag Pump) and self-contained within the enclosure.
Work chamber base pressure: 5E 6 Torr and operating pressure: < 6E 5 Torr.
Penning gauge and solid state sensor should be provided to monitor the chamber
vacuum and backing pressure respectively.
Operating condition
Less than 200 Watts during operation, less than 100 Watts at idle
100/240 VAC at 50/60Hz
The system should operate with high purity Argon at 25psi (1.72 bar)
Manufacture and product safety
The system shall have CE certification
Cooling
The system shall be air cooled only (no water).
 ITEM No. 21B. DISC PUNCH
For 3 mm dia circular samples
Preferable user independent, horizontal cutting action

ITEM No. 21C. DISC GRINDER with Lapping Kit

Manual operation for 3 mm dia specimens. Specimen lapping kit with at least 3 glass
lapping plates and approximately 100 lapping discs for each grit size
Disc mount with goniometer with at least 10 micron graduation on the scale

ITEM No. 21D. DIMPLE GRINDER WITH

STEREOMICROSCOPE
Suitable for 3 mm diameter samples and dimpling depth down to 10 microns or less
should be possible.
Automatic termination of the process and digital/ analog micrometer to indicate depth
should be provided.
All required consumables including copper and SS wheels must quote separately.

HOT PLATE FOR SPECIMEN MOUNTING

With thermostatic control of temperature and suitable sample mount holders

ITEM No. 21E. JET POLISHER FOR TEM SAMPLE

PREPARATION OF METALLIC SAMPLES
The automatic electrolyte jet thinning equipment should be capable to prepare a
perforated specimen of 3mm diameter for TEM from a sample thickness of about 0.5mm
to a thickness of less than 50nm.The thinning unit should consist of a control unit,
polishing unit
Control Unit:
A separate control unit should be provided incorporating power supply, programming
and monitoring functions. It should have the following features:
Should be fully automatic and microprocessor controlled.
Should have an electronic thermometer to measure temperature of the electrolyte.
Should have an adapter to connect to the polishing unit.
Mains voltage should be single phase, 220-240 V, 50Hz.
Output voltage should be in the range 0-100V DC and current in the range 0-2A.
 LCD display of required parameters like current, electrolyte temperature and
elapsed thinning time.
A built-in scan function to determine the correct polishing voltage for any
material is a must.
A database to accommodate up to 200 user methods of electrolytic thinning for
different materials.
Automatic stopping of the polishing process if the temperature of the electrolyte
exceeds the predetermined temperature.

Polishing unit:
The polishing unit should be compatible to the control unit and the specimen should be
polished from both sides simultaneously. The polishing unit should also have the
following features:
Should have a specimen holder for 3mm diameter and 0.5 mm thick specimens
where one part of the holder should carry a platinum conductor so that electrical
connection to the polishing circuit is automatically established.
Should have set of jets of 1mm diameter for thinning 3mm diameter specimens.
Infrared detector to stop the thinning process automatically once the perforation
appears.
All the parts, which would be in contact with chemicals, should be made of
corrosion-resistant material.

List of customers in India along with phone numbers and email addresses.
Also,indicate the level of training for local service capability in India and indicate
thetypical response time for service.
 ITEM No. 21F: HIGH SPEED SAW FOR PRECISION CUTTING

QUANTITY REQUIRED: ONE

The high speed precision cutting saw is used to cut materials automatically at high speed.
This can be used to section smaller and hard samples which are difficult to section using
an abrasive saw.

Description Specifications
Shaft speed Around 5000 RPM continuously
variable with digital speed indicator.
Drive motor 746 W (1.0 HP) or higher
Cutting chamber clean out hose manual, blade Required
positioning, durable hood and aluminium cast base.
Precise thickness adjustment micrometer with least 10 m or better
count.
Easily adjustable and variable load. Electronics Required
Microprocessor controlled with LCD display.
Removable coolant tank with easy cleaning 35 l approx capacity,
mechanism. approx. 2.5 l/min flow rate
Feed rates. 1.0-20.0 mm/min, 0.2-0.3mm
increment

Blade diameters. 125.0, 150.0, 175.0, 200.0 mm max.

& thickness of 0.38, 0.5, 0.64, 1.27
mm
(0.015" / 0.020" / 0.025" / 0.035")
Appropriate sleeves for fixing of blades. Retains last Required
setting and with process prompts.
Specimen holders for irregular shapes, and Diameters range 5-50mm
cylindrical samples. (1 each)
High concentration diamond wafering blades of 1 each
various diameters for use on this machine.
Input supply 220V, 50Hz.
Overload protection and emergency stop facility. Required
Magnetic safety interlock
Suggested consumables for cutting 500 samples. Free installation and training to 2-3 persons
at the installation site (MNIT Jaipur). Warranty for three years. Recommended spares for
trouble free operation. Two copies of Manuals.
 ITEM No. 21G:AUTOMATIC MOUNTING PRESS
QUANTITY REQUIRED: ONE
This m/c should be suitable to mount samples for metallographic purpose. The samples
are mounted using phenolic/acrylic resin powders and at predefined mounting pressures
and heating and cooling time.

Description Specifications
Mounting material Phenolic / Acrylic
Mounting of more than one specimen. Desirable
Pressure application. Electro-hydraulic
Requiring no air.
Mount sizes with easy 25 mm (1) and 38 mm (1.5)
interchangeability.
User selectable pressure, temperature, Required
Heating time, cooling time, mount size
Moulding pressure. Preferred range
75 kg/cm2 to 325 kg/ cm2 in steps of 5 ~ 10 kg/
cm2
Moulding Temperature. 150 & 180 C suitable for phenolic and acrylic
material.
Adjustable heating and cooling time in Maximum 30 minutes in steps (mention steps).
30 minutes or better in steps of 10
seconds. LCD with user friendly touch
panel controls.
Heating unit. Minimum 1000 W
Insulated closure with effective heat
control.
Robust mould closure mechanism. Bayonet type for safety.
Effective Heating and cooling system. Required
Electronic touch pad controls for easy Required
operation.
Microprocessor programmed mounting Required
steps and cycle. Should retain the last
used programme.
Cylindrical moulds with duplex Required
mounting rams with spacers.
Alarm signal for cycle completion. Required
Input supply 220V, 50Hz
Offer should include suggested consumables for mounting of 500 samples. Free installation
and training to 2-3 persons at the installation site (MNIT Jaipur). Warranty for three years.
Recommended spares trouble free operation. Manuals two copies.
 ITEM No. 21H: TWIN WHEEL GRINDER / POLISHER FOR
MANUAL OPERATIONS
QUANTITY REQUIRED: ONE

This grinding / polishing machine can be used for manual polishing. Microprocessor
controlled machine.

Description Specifications
Provided with variable speed, high torque geared motor; for 10-500 rpm, 746 W minimum
polishing & geared motor for sample holder. (1.0 HP), 40.0 W 50.0 W
Corrosion resistant, non conductive, chemically inert body Required
with vibration free base.
Platen rpm Variable rpm of 10-500,
continuously variable.
Disc Aluminium or suitable
material with a diameter of
200 mm (8)
Manual and semi-automatic programmable when connected Required
with a power head.
Facility draining water. Required
Electronic touch pad controls for easy operation with Required
parameter memory to retain last speed setting.
Wheel speed to be independent of load. Required
Spare magnetic discs & bimetallic plates. One each, required
Input supply 220V, 50 Hz.
Suggested consumables for polishing 500 samples. Free installation and training to 2-3
persons at the installation site (MNIT Jaipur). Warranty for three years. Recommended
spares for trouble free operation. Two copies of manual.
 ITEM No. 21I:SEMI AUTOMATIC GRINDER/POLISHER WITH
POWER HEAD
QUANTITY REQUIRED: ONE

This grinding / polishing machine can be used for polishing.

Semi Automatic Table top Grinder Polisher

Sealed Membrane Keypad or Color Touch-Screen Controls.
Choice of 8"(203mm) or 10"(254mm) Diameter Platens,
Unique LED Lighting Illuminates Platen, Bowl, Specimens & Working Area
High Torque Motors For Large & Multiple Specimen Preparation
Single or Central Force Power Head: Six Single Force Fingers Prepare 1-6 Samples at Same time.
UseCentral Force for multiple sample preparation.
Durable Cast AluminiumConstructionStain, Chip, & Corrosion Resistant Finish
Retractable Waterhose& 360 Bowl Rinse System
D-Style Bowl for Easy Platen Changing Exchangeable Bowl Liner
Splash Guard & Lid, Air & Water Filter
Machine Power: 85-264 VAC/170-264VAC, single phase, Frequency: 50/60 Hz,
Grinder Polisher:
Platen Wheel Speed:10-500 rpm in 10 rpm increments, at least 1 HP motor power
Wheel Direction:Clockwise or Counter-Clockwise
Power Head:
Motor Power-at least 0.156Hp(116W); Rotation Direction:Complementary or Contra
Speed: 30-60 rpm in 10 rpm increments, Central Specimen Force:20-260N, Single Specimen Force:
5-45N
Specimen Capacity:
Central Mode :1",1-1/4",1-1/2", , Large & Irregular Specimens
Single Mode:1",1-1/4",1-1/2".Large & Irregular Specimens
Regulatory standard:
CE Marked&EC Applicable Directives

Suggested consumables for polishing 500 samples. Free installation and training to 2-3 persons at the
installation site (MNIT Jaipur). Warranty for three years. Recommended spares for trouble free
operation. Two copies of manual.
 ITEM No. 21J:VACCUM IMPREGNATION EQUIPMENT

QUANTITY REQUIRED: ONE

The vacuum pump supplies sufficient vacuum to quickly evacuate entrapped air from any
porous specimen. High strength plastic chamber maintains vacuum throughout the
impregnation period by means of a simple O ring seal.

Technical Specification

Equipment should have high strength plastic vacuum chamber, built-in synchronous
motor and rotating turn table, pouring mechanism, vacuum gauge, hoses, filtering flask,
glass tubing, rubber stopper, 100 graduated paper cups, 12 SAMPL-KUPS, 100 vacuum
table liners, Drierite dehydrating agent and vacuum pump.

Single phase, 220V/50Hz. operating instructions manual should be included.

Several specimens should be impregnated at one time using a unique rotary table, within
the vacuum chamber.

The ingenious pouring mechanism should enable the premixed mounting compound to be
placed inside the chamber and then poured into molds one at a time. A variety of epoxy
castable (cold) mounting compounds can be used. Since the specimens are encapsulated
under vacuum, the possibility of air entering is completely eliminated.

Free installation and training to 2-3 persons at the installation site (MNIT Jaipur).
Warranty for three years. Recommended spares for trouble free operation. Two copies of
manual should be provided.
 ITEM No. 21K: Automatic and Manual bench top Abrassive
cutter
QUANTITY REQUIRED: ONE

Equipment should have following silent features:

Include four option sectioning methods.

Triple X-Y-Z Axis cutting capability.
12(305mm) Abrasive Cut-Off Wheel Capacity.
SMARTCUT system which reduces feed rate automatically to produce burn free,
consistent cuts.
5Hp(3.7kW), high torque ( 2600rpm ) motor powers through difficult to section
materials.
Can section upto 4.375(110mm) dia sample.
Long Lasting Corrosion Resistant Construction with Stainless Steel T-Slot Tables.
Large Cutting Chamber, Cutting Envelope & Side Ports Accomodates a Variety of
Sample Sizes.
Brake, Direct or Pulse Cutting action.
Color touch screen controls with e-stop.
Designed with safety as top priority, constructed of a protective metal hood & clear
protective window.

Technical Specifications:

Voltage: 220/230/380/460 VAC(selectable)

Power Consumption: 3.5 kW.
Frequency: 50/60 Hz.
Phase: 3 phase.
Cutting Wheel Dia: 12(305mm)
Travel Movement: Z-Axis(Up/Down): 5.75(150mm)
Y-Axis(Back/Forth): 10.25(260mm)

X-axis(Left/Right): 2.75(70mm)

Current: 15.7 amps @ 220/230VAC

Auto Y-axis Feed Rate: 0.002/sec 0.1/sec(0.05mm/sec 1mm/sec).
Coolant Tank Capacity: 27 gallon(90 liter)

Free installation and training to 2-3 persons at the installation site (MNIT Jaipur).
Warranty for three years. Recommended spares for trouble free operation. Two copies of
manual should be provided.
 ITEM No. 21L: ULTRASONIC CLEANER
QUANTITY REQUIRED: ONE

This equipment should have single piece cabinet, solid-state 185 watt power source, 47
kHz transducer, 29.2cmx24.1cmx15.2cm stainless steel transducer tank, sample of
Cleaning Solution, mechanical timer controls the cleaning cycle time, tank cover, cord,
and plug. The new cleaners are sealed tight to prevent leaks and they are safer to fill. The
control board is mounted high for more accessible, spill-resistant controls. The new
design consolidates components to reduce wiring, connectors, and failures, ensuring
added safety. For operation on 220V/50Hz/1 phase. Overall dimensions not more than
14.6x15.7x15.8 (32.0cmx39.9cmx40.1cm). Shipping weight 10lbs.

Tank Cover: stainless steel.

Insert Tray, solid stainless steel, 8W x 4D x 3H (20.3cmx12.2cmx7.6cm)

Insert Tray, perforated stainless steel, 8W x 4D x 3H (20.3cmx12.2cmx7.6cm)

Suspension Bracket for specimen holder.

Free installation and training to 2-3 persons at the installation site (MNIT Jaipur).
Warranty for three years. Recommended spares for trouble free operation. Two copies of
manual should be provided.
 ITEM NUMBER 22: List of instruments for department of Electronics and
Communication Engineering

Following is list of equipment proposed:

List of Instruments and Description

Sl.No
22A Semiconductor Device Analyzer (SDA) for IV and CV measurements -01 nos.
Specifications
Bias voltage range 0-20V
Frequency range 0-50MHz
Add Working Standard Set
CMU Accessories:
SMU CMU Unify Unit (SCUU)
Add-on Package - Capacitance Measurement Unit 1ea, Cable 1ea
Add-on Package - High Power Source Monitor Unit 1ea, Cables
Probe measurement set-up unit- 1 no.
Basic source measurement unit- 03 nos
SDA should be capable of measuring resistivity.
Warranty:3 Years
22B Device Modeling software for DC and RF Semiconductor device
characterization (IC-CAP Simulation and Analysis).
Specifications

RF and microwave modeling

Capabilities
BJT modeling
CMOS modeling
MESFET modeling
Warranty: 3 Years
22C COMSOL (software)
Multiphysics Module:5 No
With following Application Specic Modules:
AC/DC Module
MEMS Module
Structural Mechanics Module
Chemical Reaction Engineering module
Heat transfer module
RF Module
Subsurface Flow Module
Material Library
Optimization Module
 Particle Tracing Module
CFD module
Live Link for MATLAB (Interface product)
Live Link for AUTOCAD
(Interface product)
Warranty: 3 Years
22D LCR Meter

Specifications

Frequency: 1MHz to 3 GHz

Resolution: 100 KHz
Measurement: High speed measurement 0.9ms (Mode 1), 2.1ms (Mode 2), 3.7
ms (Mode 3)
Accuracy: < 1%
Impedance measurement range : from 140 mOhm to 4.8Kohm

It should combine with High temperature component fixture and temperature

setup (27 to 1200OC)
Also it should possible of dielectric measurements for different ceramic
samples
Also LCR meter should be support to resistivity changes with temperature
measurements
Interface: USB and LAN
Add Working Standard Set
Calibration Kit
Test Fixture Stand and extension cable set
Standard hard disk drive
3.5mm to 7 mm coaxial adaptor
Short bar set, test fixture, SMD test fixture, performance test kit
Warranty: 3 Years
22E Digital Oscilloscope
Specifications
Analog Channels: 4
Sample Rate: 2GSa/s
Memory: 2Mpts
Update Rate:1,000,000 waveform per second
Standard Interface: USB Host & Device, P/F Out
Frequency: 300MGHz,
Upgradeable upto 1GHz in future type (Model DSOX3034A)
Should have built-in Arbitrary Function Generator generator
Warranty: 3 Years
22F Arbitrary Function generator

Specifications
1Hz to 30MHz, Sine, Square, pulse frequency range with 1Hz resolution

< 40 ps jitter and less than .04% THD

250 MSa/s, 16 bit sampling rate for higher time resolution

True point by point Arbitrary waveforms

LAN (LXI-C) and USB interface

Warranty: 3 Years
22G Vacuum Coating Unit
Specifications

Chamber Vacuum :10-5mbar

It should be with accessories like Substrate Heating, Rotary Drive, Flash
Evaporation, EB Gun evaporation etc. to meet the specific requirements of the
customers.
8 KW Electron Beam Gun 270 bent beam with 4 source or Single source
capacity,

6 KW power supply,
Planetary drive,
Digital Thickness Monitor
It should connected with Water chiller plant
Accessories:
25 Nos P and N type Si Substrate (wafer)
ITO Glass substrate
Tungsten , Tantalum and Molybdenum Boat Sources(10 sets)
Warranty: 3 Years

22H Advanced Photonic Simulator

It should be able to model and design complex functional materials,
components and devices. Able to model and simulate active and passive
Photonic Integrated Circuits (PICs). Can be used for silicon photonics design,
silicon nanowires, nonlinear functional materials, nano-photonics. It should be
capable of engineering the bandgaps of materials and as a flexible layout editor
for 2D and 3D photonic crystal lattices, including Thin films such as Bragg
gratings.
Warranty: 3 Years
22I Programmable Spin coater (Micro controlled)

Specifications

Spinning speed : 10 - 10000rpm

Program memory : 5 programs (non volatile)
Accuracy : < 1%
It should be calibration option
: 1, 3 and 5 inc d
Substrate base plate circular dia

It should be connected with One vacuum pump

N2 purging facility and saving option in memory Preset editable recipes
It should be spill drainage facility and integrated vacuum release switch
Warranty: 3 Years
22J Magnetic stirrer with hot plate (2No)

Lab Hot Plate with Magnetic Stirrer Specifications

Number of stirring positions 1

Speed display LED

Speed range 0/50 - 1500 rpm
Heat output 600 W
Heating temperature range room temp. - 310 C
Heat control accuracy 1 K
Speed control stepless
Adjustable safety circuit min. 50 C
Adjustable safety circuit max. 360 C
Connection for ext. temperature sensor PT1000
Control accuracy with sensor 1 K
Set-up plate material Aluminium alloy
Set-up plate dimensions 135 mm
Voltage 230
Frequency 50 Hz
Power input 650 W

Warranty: 3 Years.
ITEM NUMBER 23: Sample Preparation chamber with chemical hood

Body: 16 Gauge G I / CRCA Powder coated external cabinet &8mmHylam/PP at

workArea,
Or {Nuwood-Laminated/ SS 304/ 316/ PPpaneling. Partition structure-
Aluminum/ CRCA sections (powder coated) With Cupboard.}
Work surface should have raised edges (1/2") and sealed to help contain any spills
and strong enough to bear the weight of any necessary apparatus.
Sliding Sash: Counter weighted glass of 5mmthick at front;
Tabletop: 18mmGranite/ PP Table top with Sink & tap Provision [Ceramic sink],
Lighting: Lighting of 36W- 2 No
Exhaust: Fromthe bottom & rear of the bench and connected with the vent to throw
the air out of the room(All necessary fittings, connections must be made)
Exhaust fan (FRP lined blower with static pressure 1.5 WG). [800-1000cfm]
Duct - PVC duct
Cupboards: cupboard is required with four partitions with shutters and locks
Motor: 1440 RPM, Single/ Three Phase
Electrical: 220 Volts, 1, 50Hz, with 4nos. of 5/15amp. Switch socket (Combined),
Noise level:Less than 60 db,
Taps: Control valves for Gases 2Nos
Connection for exhaust duct should be provided in the walls or roof of the hood.
The vertically moving sash should be movable throughout its travel
byapplicationless force and should remain stationary when force is removed.
Attach the drawing of the complete fume hood along with the quotation and provide
the catalogue containing the quoted model number.

Any other necessary accessories can be quoted separately.

 ITEM NUMBER 24: DEIONIZED WATER UNIT

SPECIFICATIONS ANALYTICAL GRADE WITH ULTRA PURE GRADE WATER

SYSTEM

SPECIFICATIONS:

Prefilter unit
A Prefilteration unit with 5 & 1 micron filter to remove the particulate matter &
booster pump for feed pressure should be provided.
Ist stage system Analytical Grade Water System
RO grade water system with following purification stages:
Prefilter with antiscaling& activated carbon for the removal of free chlorine &
organics.
Reverse osmosis for removal of ionic & inorganic impurities.
Conductivity cell present before RO stage (cell constant 0.01/cm) to measure the
RO feed conductivity.
Self regenerating Electro-deionisation principle with Carbon beads on cathode for
less recurring cost & consistent water quality.
No softening cartridge should be present immediately before Electro de ionization
principle.
Feed water handling of conductivity up to 2000 microS/cm, Free chlorine up to 3
ppm & Fouling Index up to 12.
Water quality: Flow rate: 3 Ltr/hr, Ions organics removal upto 99%, Resistivity:
5-15 Mohm.cm, TOC < 30 ppb.

Reservoir
Reservoir of 50 liter capacity.

IInd stage system Ultra Pure Grade Water System

Ultrapure water machine producing water of Resistivity: 18.2 MOhm.cm, Conductivity:

0.055 uS/cm, Microorgamisms: < 0.1cfu/ml, Flow rate: up to 1.5 Ltr/min, TOC: < 10
ppb, Endotoxin < 0.001 Eu/ml, RNase: < 0.01ng/ml, DNase: < 4pg/l.

Automatic recirculation feature.

Volumetric dispensing.

Assistant Registrar
Stores & Purchases